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Current:Home » Product Categories » » High tensile U-type MoSi2 Rod
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High tensile U-type MoSi2 Rod
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Product:
Brand: aa 
Price: 30.00USD/ 
MOQ: 50  
Total supply:
Delivery time: From the date of payment from the buyer within days of delivery
update time: 2023-07-12 01:00  Valid to:Long-term effective
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High tensile Silicon Molybdenum Rod with U Type

1.MoSi2 heating element is a kind of resistance heating element made from Molybdenum Disilicide. It can be exerted under the high temperature of the oxidated atmosphere. MoSi2 elements have the unique function of high temperature anti-oxidation. Under the oxidated atmosphere, the maximum temperature of MoSi2 elements is 1800°C. It can be made into various types, including U-type, W-type, right-angle as well as circular type.

 The general temperature of MoSi2 heating rods is from 1300°C to 1800°C, which is universally applied to the field of  metallurgy, glass, ceramics, magnetic matrials, refractory materials, crystals, electron devices and kiln etc. It is the ideal heating element of high temperature anealing.

2.Technical Data

Density

Bending Strength

Hardness

Apparent Porosity

Water Absorption

Elongation

Fracture Toughness

Compressive Strength

5.8g/cm3

350Mpa

12.0Gpa

±2%

0

4%

4.5Mpa.m1/2

650Mpa

3.The influence of operation temperature on the heater surface in a different atmosphere

 

                                Atmosphere

1700 Type

1800 Type

Air

1700

1800

N2

1600

1700

He

1600

1700

-80°C Dry H2

1150

1150

-20°C Wet H2

1450

1450

10%CO2, 50%CO, 15%H2

1600

1700

40%CO2, 20%CO

1400

1450

Cracked and Partially Burnt Ammnia

1400

1450

 

4. MoSi2 heating elements physics and chemistry characters:

1) Physics Characters

Volume Density

Bending Strength

Vickers Hardness

Porosity

Water absorption

Heating Elongation Rate

5.5 g/cm3

15-25 kg/cm3

(HV)570kg/mm2

7.4%

1.2%

4%


2.)Chemistry Character
MoSi2 heating element is used in the high temperature under oxidizing atmosphere. It will form the SiO2 film which can keep the element from being melted. During the oxidizing process, the SiO2 protecting film is formed again when the element continues to be used.
 

  

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